Industrial water purifier

Applicable Standards

Industrial water purifier systems adhere to global purity and safety benchmarks, including:

• ASTM D1193 (Specifications for Reagent Water)
• USP <643> (Total Organic Carbon in Pharmaceutical Waters)
• ISO 3696 (Water for Analytical Laboratory Use)
• SEMI F57 (Ultrapure Water Specifications for Semiconductor Manufacturing)
• GB/T 6682 (China’s National Standard for Laboratory Water)

These standards define purity levels (e.g., resistivity ≥18.2 MΩ·cm, TOC <10 ppb) for specific industries.

Main Parameters

Working Principle

The system employs a multi-stage purification process:

1. Pre-treatment: Sediment/carbon filters remove large particles, chlorine, and organic matter.
2. Reverse Osmosis (RO): Semi-permeable membranes reject 95–99% of dissolved salts and ions.
3. Electrodeionization (EDI): Ion-exchange resins and electric fields further polish water to ultrapure levels.
4. UV Sterilization: 185/254 nm wavelengths destroy bacteria and degrade TOC.
5. Ultrafiltration: 0.22μm filters ensure particle-free output.

Test Principle & Validation

Pure water systems undergo rigorous testing:

• Resistivity/Conductivity: Real-time monitoring to verify ion removal (18.2 MΩ·cm = 0.055 μS/cm).
• Total Organic Carbon (TOC): Oxidation-based analyzers detect organic contaminants (<10 ppb for semiconductor use).
• Microbial Testing: Membrane filtration or ATP bioluminescence assays confirm sterility (<1 CFU/mL).
• Endotoxin Validation: LAL (Limulus Amebocyte Lysate) tests ensure <0.03 EU/mL for pharmaceutical applications.

Applications include:

• Pharmaceuticals: Sterile water for injection (WFI) and cleaning validation.
• Electronics: Rinsing wafers in semiconductor fabrication.
• Power Plants: Boiler feedwater to prevent scaling.
• Laboratories: HPLC solvents and analytical reagent preparation.

Industrial pure water machines are indispensable for industries demanding zero-tolerance contamination, offering scalable, efficient, and validated solutions for critical processes.